Company Filing History:
Years Active: 2002
Title: Michael Feldbaum: Innovator in Plasma Etching Technology
Introduction
Michael Feldbaum is a notable inventor based in Fremont, California. He has made significant contributions to the field of plasma etching technology, particularly in the area of silicon substrate processing. His innovative methods have paved the way for advancements in semiconductor manufacturing.
Latest Patents
Feldbaum holds a patent for a "Method of anisotropic etching of substrates." This method involves plasma etching of silicon, utilizing plasma to create laterally defined recess structures through a mask. The technique is characterized by the variation of plasma parameters, which allows for a well-controlled anisotropic etch. This method achieves a high etch rate and excellent selectivity concerning the mask. The process involves introducing a mixed gas into a vacuum chamber after evacuation, generating plasma within the chamber, and exposing the substrate's surface to the plasma. Power sources are employed to form the plasma discharge, and an integrated control system modulates the plasma discharge power and substrate polarization voltage levels.
Career Highlights
Michael Feldbaum is currently associated with Alcatel, where he applies his expertise in plasma etching technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor fabrication processes.
Collaborations
Feldbaum has collaborated with talented individuals such as Tamarak Pandhumsoporn and Kevin Yu, contributing to various projects and innovations in the field.
Conclusion
Michael Feldbaum's contributions to plasma etching technology exemplify the impact of innovative thinking in the semiconductor industry. His patented methods continue to influence advancements in manufacturing processes, showcasing the importance of inventors in driving technological progress.