Company Filing History:
Years Active: 2014
Title: **Michael D. Williams: Innovator in Polishing Pad Technology**
Introduction
Michael D. Williams is an accomplished inventor based in Midland, MI, USA. He holds a patent that showcases his innovative approach to the manufacturing of polishing pads, specifically designed for use in polishing magnetic, semiconductor, and optical substrates. His contributions to the field highlight the importance of technological advancements in material processing.
Latest Patents
Williams' patent, titled "Method of forming open-network polishing pads," is a significant innovation. This method involves the formation of an open-network polishing pad, which is achieved through a carefully orchestrated process. The foundation of this invention lies in a polymer sheet or film made from a curable polymer. By exposing this polymer sheet to a controlled energy source, an exposure pattern is created with elongated sections. Subsequently, once the polymer sheet is attached to an open-network substrate, the method facilitates the removal of polymer adjacent to the exposed portions using a solvent. This process leads to the formation of elongated channels within the polymer sheet, generating an open-network polishing pad that meets specific industrial polishing needs.
Career Highlights
Michael D. Williams currently works at Dow Global Technologies LLC, where he continues to drive innovation in material science and engineering. His patent exemplifies his dedication to improving processes that have far-reaching applications in various technological sectors. This breakthrough indicates his knowledge and expertise in the realm of polymer applications for high-tech industries.
Collaborations
In his innovative journey, Williams has collaborated with notable colleagues, including Hamed Lakrout and Ben W. Schaefer. These collaborations reflect a shared dedication to advancements in technology and a commitment to overcoming challenges through collective expertise in their respective fields.
Conclusion
Michael D. Williams stands out as a visionary in the realm of polishing pad technology. His invention serves as an example of how innovative methods can lead to significant improvements in material processing. With continued advancement in this space, Williams' contributions are likely to influence future developments in surface polishing technologies.