Company Filing History:
Years Active: 2002
Title: Michael D Slessor: Innovator in Dielectric Films
Introduction
Michael D Slessor is a notable inventor based in Campbell, CA (US). He has made significant contributions to the field of dielectric films, holding 2 patents that showcase his innovative methods and materials.
Latest Patents
Slessor's latest patents include two methods for creating dielectric films from organohydridosiloxane resins. The first patent focuses on dielectric films with high organic content. This method involves forming a solution of a solvent and the organohydridosiloxane resin, dispensing the solution on a substrate, spinning the substrate, baking it to remove the solvent, and curing it to form the dielectric film. The resulting films exhibit dielectric constants of approximately 2.8 or lower. The second patent addresses dielectric films with low organic content, utilizing a similar process but with up to 40 mole percent of an organic substituent. These films demonstrate dielectric constants of approximately 3 or lower.
Career Highlights
Michael D Slessor is currently employed at Honeywell International Inc., where he continues to develop innovative solutions in the field of materials science. His work has contributed to advancements in dielectric film technology, which is crucial for various electronic applications.
Collaborations
Slessor has collaborated with notable colleagues, including Nigel P Hacker and Scott P Lefferts, enhancing the research and development efforts within his team.
Conclusion
Michael D Slessor's contributions to dielectric film technology reflect his innovative spirit and dedication to advancing materials science. His patents and work at Honeywell International Inc. underscore his role as a key inventor in this field.