Company Filing History:
1 out of 832,891 Years Active: 2003
Title: Michael C Matter: Innovator in Electron Beam Lithography
Introduction
Michael C Matter is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of electron optics, particularly in the development of advanced lithography tools. His innovative work has led to the creation of a patent that enhances the capabilities of electron beam lithography systems.
Latest Patents
Michael C Matter holds a patent for "Electron optics for multi-beam electron beam lithography tool." This invention describes a charge particle optical column designed for high throughput, multi-column, multi-beam electron beam lithography systems. The column features purely electrostatic components, a compact footprint of 20 mm square, and multiple individually focused charge particle beams. It allows for telecentric scanning of all beams simultaneously on a wafer, which increases the depth of field. Additionally, the invention includes a conjugate blanking mechanism for the charged particle beams, which reduces beam blur during operation. The electron gun utilizes microfabricated field emission sources and a microfabricated aperture-deflector assembly, acting as a perfect lens for focusing, steering, and blanking multiple electron beams.
Career Highlights
Throughout his career, Michael C Matter has demonstrated a commitment to advancing technology in the field of electron optics. His innovative designs and patents have positioned him as a key figure in the development of next-generation lithography tools. His work is essential for improving the efficiency and precision of electron beam lithography systems.
Collaborations
Michael has collaborated with notable professionals in his field, including N William Parker and Alan D Brodie. These collaborations have contributed to the advancement of technology and innovation in electron optics.
Conclusion
Michael C Matter is a distinguished inventor whose work in electron beam lithography has made a significant impact on the industry. His patent showcases his innovative approach to solving complex challenges in electron optics. His contributions continue to influence the development of advanced lithography technologies.