Company Filing History:
Years Active: 1994-1995
Title: Michael B Rowlandson: Innovator in Trench Capacitor Technology
Introduction
Michael B Rowlandson is a notable inventor based in Ottawa, Canada. He has made significant contributions to the field of integrated circuits, particularly in the development of trench capacitor structures. With a total of 2 patents to his name, Rowlandson's work has advanced the efficiency and effectiveness of semiconductor technologies.
Latest Patents
Rowlandson's latest patents focus on methods for forming electrodes of trench capacitors. These methods aim to reduce the number of mask levels required in the manufacturing process, making them compatible with both CMOS and Bipolar CMOS processes. The process begins with defining a trench in a substrate through conventional photoengraving and anisotropic etching. Successive conformal layers of dielectric and conductive materials are deposited to fill the trench. The resulting structure is then planarized, preferably using chemical-mechanical polishing, to achieve a fully planarized topography. Each conductive layer forms an electrode, with coplanar areas exposed within the trench for contact formation. The trench design includes both wide and narrow portions, allowing for efficient contact to multiple electrodes through a maskless process.
Career Highlights
Michael B Rowlandson has been associated with Northern Telecom Limited, where he has applied his expertise in integrated circuit technology. His innovative approaches have contributed to advancements in the field, particularly in the design and manufacturing of trench capacitors.
Collaborations
Rowlandson has worked alongside notable colleagues such as Joseph P Ellul and John M Boyd. Their collaborative efforts have furthered the development of technologies in the semiconductor industry.
Conclusion
Michael B Rowlandson's contributions to trench capacitor technology exemplify his commitment to innovation in the field of integrated circuits. His patents reflect a deep understanding of semiconductor processes and a drive to enhance manufacturing efficiency.