Michael B Power

Title: Michael B Power: Innovator in Chemical Vapor Deposition

Introduction

Michael B Power is a notable inventor based in Quincy, MA (US). He has made significant contributions to the field of chemical vapor deposition, holding 2 patents that showcase his innovative approaches to forming passivating and buffer films.

Latest Patents

His latest patents include a liquid precursor and method for forming a cubic-phase passivating/buffer film. This chemical composition, which consists essentially of ((t-amyl)GaS).sub.4, can be employed as a liquid precursor for metal organic chemical vapor deposition. This process allows for the formation of a cubic-phase passivating/buffer film, such as gallium sulphide. Another patent details a method for forming a passivating/buffer film on a substrate. This method involves heating the substrate to a temperature sufficient to cause a volatilized organometallic precursor to pyrolyze, thereby forming the desired film. The process includes directing a carrier gas across the precursor source to transport the volatilized precursor to the substrate, where it is deposited to create the passivating/buffer film.

Career Highlights

Throughout his career, Michael has worked with prestigious institutions such as Harvard College and Triquint Semiconductor Corporation. His work has significantly advanced the understanding and application of chemical vapor deposition techniques.

Collaborations

Michael has collaborated with notable individuals in his field, including Andrew R Barron and Andrew N MacInnes. These collaborations have contributed to the development of innovative solutions in chemical processes.

Conclusion

Michael B Power's contributions to the field of chemical vapor deposition are noteworthy. His patents and collaborations reflect his commitment to advancing technology in this area. His work continues to influence the development of electronic and electro-optical circuits.