Company Filing History:
Years Active: 2005
Title: Michael B Krell: Innovator in Optical Profilometry
Introduction
Michael B Krell is a notable inventor based in Tucson, AZ (US). He has made significant contributions to the field of optical profilometry, particularly through his innovative patent that enhances measurement techniques. His work is instrumental in improving the accuracy and efficiency of surface analysis.
Latest Patents
Krell holds a patent for an "Alignment and correction template for optical profilometric measurement." This invention involves an electronic template that delineates distinct selected patterns corresponding to predetermined regions of interest in a sample part. The surface of the sample is first measured using conventional techniques. The data acquired are used to identify boundaries between distinct regions, which are then compared to a predetermined pattern boundary in the template to find a best-fit match. The position of the pattern is then shifted to overlay the match, thereby automatically aligning the template's selected patterns with the regions of interest in the sample surface. As a result, profilometric analysis can be limited to the regions of interest. Correction factors are also assigned to each selected pattern in the template to account for physical differences in the corresponding regions of interest of the sample part that affect the profilometric measurement.
Career Highlights
Michael B Krell is associated with Veeco Instruments Inc., a company known for its advanced measurement and process equipment. His role at Veeco Instruments Inc. allows him to apply his innovative ideas in practical applications, contributing to the company's reputation in the industry.
Collaborations
Krell has worked alongside talented colleagues, including Colin T Farrell and Anthony L Martinez. Their collaboration fosters a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Michael B Krell's contributions to optical profilometry through his innovative patent demonstrate his commitment to advancing measurement techniques. His work continues to influence the field and improve the accuracy of surface analysis.