Company Filing History:
Years Active: 2007-2008
Title: Merrick Miles: Innovator in Photoresist Technology
Introduction
Merrick Miles is a notable inventor based in Raleigh, NC (US). He has made significant contributions to the field of photoresist technology, holding 2 patents that showcase his innovative approach to lithography.
Latest Patents
Merrick's latest patents focus on low pH development solutions for chemically amplified photoresists. One of his methods involves carrying out positive tone lithography with a carbon dioxide development system. This process includes several steps: providing a substrate with a polymer resist layer, exposing portions of the polymer resist layer to radiant energy to create light and dark field regions, optionally baking the polymer resist layer, and then contacting it with a carbon dioxide solvent system. The solvent system consists of a first phase of carbon dioxide and a second phase of a polar fluid, allowing for preferential removal of the light field region compared to the dark field region.
Career Highlights
Merrick Miles is currently associated with Micell Technologies, Inc., where he continues to develop and refine his innovative techniques in photoresist technology. His work has been instrumental in advancing the capabilities of lithography processes.
Collaborations
Merrick collaborates with talented individuals such as Mark Wagner and Chris Harbinson, contributing to a dynamic and innovative work environment.
Conclusion
Merrick Miles stands out as a key figure in the field of photoresist technology, with his patents reflecting a commitment to innovation and excellence. His contributions are paving the way for advancements in lithography processes.