Company Filing History:
Years Active: 2001
Title: Meow-Ru Hsu: Innovator in Integrated Circuit Technology
Introduction
Meow-Ru Hsu is a notable inventor based in Yun Lin Hsien, Taiwan. He has made significant contributions to the field of integrated circuit technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Meow-Ru Hsu holds a patent for a method titled "Shallow trench isolator via non-critical chemical mechanical polishing." This invention outlines a process for implementing shallow trench isolation in integrated circuits. The method involves etching STI regions, depositing and etching back an insulator oxide layer, and forming a planarized insulator oxide layer. The process continues with the deposition of a silicon nitride cap layer and the use of non-critical photoresist patterning to expose larger active regions. The subsequent steps include polishing the cap layer on smaller active regions and removing the insulator oxide layer beneath it. The shallow trench isolation process is completed after the pad oxide is removed.
Career Highlights
Meow-Ru Hsu is currently employed at Vanguard International Semiconductor Corporation, where he applies his expertise in semiconductor technology. His innovative approach has led to advancements in the manufacturing processes used in the industry.
Collaborations
He has collaborated with notable colleagues, including Fu-Liang Yang and Chung-Ju Lee, contributing to various projects within the semiconductor field.
Conclusion
Meow-Ru Hsu's contributions to integrated circuit technology through his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the efficiency of manufacturing processes in this critical field.