Company Filing History:
Years Active: 2003-2004
Title: The Innovations of Meng-Hsum Cheng
Introduction
Meng-Hsum Cheng is a notable inventor based in Chung-Li, Taiwan. He has made significant contributions to the field of chemical engineering, particularly in the development of photoresist compositions. With a total of 3 patents to his name, Cheng continues to push the boundaries of innovation in his industry.
Latest Patents
Cheng's latest patents include advancements in monomer for chemical amplified photoresist compositions and the chemical amplified photoresist compositions themselves. These innovations are crucial for the semiconductor manufacturing process, enhancing the efficiency and effectiveness of photoresist materials.
Career Highlights
Meng-Hsum Cheng is currently employed at Everlight USA, Inc., where he applies his expertise in chemical engineering to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of photoresist materials, which are essential in the production of integrated circuits.
Collaborations
Cheng has collaborated with talented individuals such as Chi-Sheng Chen and Yen-Cheng Li. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Meng-Hsum Cheng is a prominent figure in the field of chemical engineering, with a focus on photoresist compositions. His contributions through patents and collaborations highlight his commitment to innovation and excellence in his work.