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Title: The Innovative Contributions of Mei Zhu
Introduction
Mei Zhu is a prominent inventor based in San Jose, California, known for her significant contributions to the field of semiconductor technology. With a total of five patents to her name, she has made remarkable advancements in electro chemical mechanical polishing methods.
Latest Patents
Among her latest patents is the "Electro chemical mechanical polishing method and device for planarizing semiconductor surfaces." This invention includes a method for electro chemical mechanical polishing of a substrate. The process involves flowing an electro chemical mechanical polishing (ECMP) slurry with a high viscosity and a polishing agent over a portion of the substrate. Electrical current is passed through the slurry and substrate. The electrical current, combined with the abrading action of the slurry as it flows over the surface of the substrate, effectively removes at least a portion of the metal layer from the substrate. The invention also encompasses various slurry embodiments.
Career Highlights
Mei Zhu has worked with notable companies such as LSI Logic Corporation and LSI Corporation. Her experience in these organizations has contributed to her expertise in semiconductor technologies and innovations.
Collaborations
Throughout her career, Mei Zhu has collaborated with talented individuals, including Wilbur G. Catabay and Igor Ivanov. These collaborations have further enhanced her work and contributions to the field.
Conclusion
Mei Zhu's innovative work in electro chemical mechanical polishing methods has significantly impacted the semiconductor industry. Her patents reflect her dedication to advancing technology and improving manufacturing processes.