München, Germany

Mattias Ahlstedt


Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Delft, NL (2003)
  • München, DE (2004)

Company Filing History:


Years Active: 2003-2004

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2 patents (USPTO):Explore Patents

Title: Innovations by Mattias Ahlstedt

Introduction

Mattias Ahlstedt is a notable inventor based in München, Germany. He has made significant contributions to the field of technology, particularly in methods related to substrate processing and metal-oxide layers. With a total of two patents to his name, Ahlstedt's work demonstrates a commitment to advancing innovative solutions in his industry.

Latest Patents

Ahlstedt's latest patents include a method for removing structures from a substrate and a method for fabricating a patterned metal-oxide-containing layer. The first patent describes a technique that involves providing a substrate with structures that need to be removed, applying a sacrifice layer, and then removing both the structures and the sacrifice layer in a polishing step. This method is advantageous as the sacrifice layer stabilizes the structures, allowing for a controlled erosion process that prevents material smearing. The second patent addresses the damage to edge sections during the patterning of a metal-oxide-containing layer. It compensates for this damage by depositing an annealing layer followed by a heat treatment step, facilitating material flow into the damaged areas. This innovation is particularly relevant for the dielectric of storage capacitors in DRAM memory cells.

Career Highlights

Ahlstedt is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to focus on cutting-edge technologies that enhance the performance and reliability of electronic components.

Collaborations

Some of Ahlstedt's notable coworkers include Walter Hartner and Günther Schindler. Their collaborative efforts contribute to the innovative environment at Infineon Technologies AG.

Conclusion

Mattias Ahlstedt's contributions to the field of technology through his patents reflect his dedication to innovation and problem-solving. His work continues to influence advancements in semiconductor technology and substrate processing.

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