Wayland, MA, United States of America

Matthias Hofmann

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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2 patents (USPTO):Explore Patents

Title: Matthias Hofmann: Innovator in Lens Measurement Technology

Introduction

Matthias Hofmann is a notable inventor based in Wayland, MA, who has made significant contributions to the field of optical measurement. His innovative work focuses on enhancing the accuracy and efficiency of lens measurement through advanced technology.

Latest Patents

Hofmann holds a patent for "Methods and apparatus for small aperture lensometer." This invention features a lensometer that incorporates a small aperture camera designed to capture images of light traveling from a display surface, through a subject lens, and to the camera. The system utilizes one or more computers programmed to perform calculations based on the captured image, computing refractive attributes for various regions of the subject lens.

Career Highlights

Matthias Hofmann is currently associated with Eyenetra, Inc., where he applies his expertise in optical technologies. His work at Eyenetra focuses on developing innovative solutions that improve lens measurement processes.

Collaborations

Hofmann collaborates with talented professionals in his field, including Vitor Pamplona and Nathaniel Sharpe. These collaborations enhance the development of cutting-edge technologies in lens measurement.

Conclusion

Matthias Hofmann's contributions to lens measurement technology exemplify the impact of innovation in the optical industry. His patent and work at Eyenetra, Inc. highlight his commitment to advancing optical measurement techniques.

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