Company Filing History:
Years Active: 2011
Title: Matthew Apanius: Innovator in Photosensitive Compositions
Introduction
Matthew Apanius is a notable inventor based in Hudson, OH (US). He has made significant contributions to the field of materials science, particularly in the development of photosensitive compositions. His work has implications for microelectronic and optoelectronic devices, showcasing his innovative approach to polymer chemistry.
Latest Patents
Matthew Apanius holds a patent for "Photosensitive compositions based on polycyclic polymers for low stress, high temperature films." This patent includes vinyl addition polymer compositions and methods for forming such compositions. The compositions are designed for use in creating microelectronic and optoelectronic devices. The vinyl addition polymer features a polymer backbone with two distinct types of repeat units derived from norbornene-type monomers. These monomers are selected from a specific formula, with one type derived from a glycidyl ether substituted norbornene monomer and the other from an aralkyl substituted norbornene monomer. He has 1 patent to his name.
Career Highlights
Matthew Apanius is currently employed at Promerus, LLC, where he continues to innovate in the field of polymer science. His work at Promerus has allowed him to explore new applications for his patented compositions, contributing to advancements in technology.
Collaborations
Some of his coworkers include Christopher Apanius and Edmund Elce. Their collaboration fosters a creative environment that enhances the development of innovative solutions in their field.
Conclusion
Matthew Apanius is a distinguished inventor whose work in photosensitive compositions has the potential to impact various technological applications. His contributions to polymer chemistry and collaboration with talented colleagues further solidify his role as an innovator in the industry.