This inventor holds 24 USPTO granted patents, primarily in Precision Polishing Technology. Top assignee: Canon Kabushiki Kaisha. Active years: 1979-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (1979)
- Ohmiya, JP (1990 - 2002)
- Omiya, JP (1999 - 2003)
- Saitama-ken, JP (2004)
Company Filing History:
Years Active: 1979-2004
Areas of Expertise:
Title: **Matsuomi Nishimura: A Pioneer in Polishing Technology**
Introduction
Matsuomi Nishimura, based in Omiya, Japan, is an accomplished inventor with an impressive portfolio of 24 patents. His work primarily focuses on innovative polishing methods and apparatuses, significantly contributing to the field of semiconductor manufacturing and cleaning technologies.
Latest Patents
Among his latest patents, Nishimura developed a polishing/cleaning method that enhances the efficiency of removing potassium and other alkaline metals. This innovative polishing apparatus integrates a polishing unit for treating the object using a polishing agent and a cleaning unit that cleans the object post-polishing. The unique design incorporates means to isolate the internal atmosphere from external influences, and the cleaning unit utilizes hot pure water or steam to clean the polished object without allowing it to dry after the polishing process.
Additionally, he has introduced a precise polishing apparatus and method that allows for the effective polishing of a body—such as a semiconductor wafer—by employing a rotating polishing pad. Notably, this method involves offsetting the center of the polished body from the rotation axis, ensuring that the entire surface is uniformly polished.
Career Highlights
Matsuomi Nishimura has made significant strides in his career while working at Canon Kabushiki Kaisha, a leading company in imaging and printing solutions. His contributions to polishing technologies have been pivotal in improving the quality and efficiency of semiconductor manufacturing.
Collaborations
Throughout his career, Nishimura has collaborated with esteemed colleagues, including Kazuo Takahashi and Mikichi Ban. Together, they have worked on advancing polishing methodologies, showcasing the importance of teamwork in the realm of technological innovations.
Conclusion
Matsuomi Nishimura's innovative contributions to polishing technologies and his extensive patent portfolio underscore his significance as an inventor in the field. His dedication to advancing cleaning and polishing methods is shaping the future of semiconductor and material production industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile