Tokyo, Japan

Masotoshi Tsuneoka


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Masotoshi Tsuneoka: Advancements in Pattern Inspection Technology

Introduction: Masotoshi Tsuneoka, an innovative inventor based in Tokyo, Japan, has made notable contributions to the field of semiconductor technology. With a total of two patents to his name, Tsuneoka has focused on developing advanced methods to enhance the precision of pattern inspections in complex electronic components.

Latest Patents: Among Tsuneoka's latest patents is the invention of a pattern inspection apparatus and method. This apparatus is specifically designed for inspecting fine patterns such as those found in semiconductor integrated circuits (LSIs), liquid crystal panels, and photomasks (reticles). The core functionality of this apparatus involves a reference pattern generation device that creates a reference pattern represented by lines, including line segments and curves, based on design data. The inspection process utilizes an image generation device that produces an image of the pattern to be inspected, while a detecting device identifies the edges of this image. Finally, the inspection device compares these detected edges with the reference pattern to ensure accuracy in manufacturing.

Career Highlights: Masotoshi Tsuneoka has built an impressive career, primarily working at Ngr Limited, where he has contributed to significant advancements in technology related to pattern inspection in semiconductors. His work emphasizes the importance of precision and accuracy in electronics manufacturing.

Collaborations: Throughout his career, Tsuneoka has collaborated with notable peers, including Tadashi Kitamura and Toshiaki Hasebe. These collaborations have fostered an environment of innovation, enabling the team to develop cutting-edge solutions within their field.

Conclusion: Masotoshi Tsuneoka's innovative spirit and dedication to pattern inspection technology have significantly impacted the semiconductor industry. His patents reflect a commitment to improving manufacturing processes, ultimately resulting in higher quality electronic components. As the field continues to evolve, Tsuneoka's contributions will surely play a crucial role in future advancements.

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