Mason A Wolak

Title: Mason A. Wolak: Innovator in Dielectric Film Technology

Introduction

Mason A. Wolak is a notable inventor based in Chagrin Falls, Ohio. He has made significant contributions to the field of dielectric materials, particularly through his innovative patent. His work focuses on enhancing the performance of dielectric films, which are crucial in various electronic applications.

Latest Patents

Mason holds a patent for a multilayered high-temperature dielectric film. This advanced film comprises a plurality of nanolayers, with at least one type of layer made from traditional dielectric materials and another type composed of high heat stability polymers. The multilayered structure demonstrates an improved storage modulus and a decreased dissipation factor at elevated temperatures. The differing dielectric permittivity between the layers ranges from approximately 0.5 to 1.5 times, showcasing the film's versatility and effectiveness.

Career Highlights

Mason is currently associated with Peak Nano Films, LLC, where he applies his expertise in developing cutting-edge dielectric materials. His innovative approach has positioned him as a key player in the advancement of high-temperature dielectric films. His work not only contributes to the field of materials science but also enhances the performance of electronic devices.

Collaborations

Mason collaborates with talented professionals such as Michael Ponting and Zahidul Wahab. Their combined expertise fosters a creative environment that drives innovation and leads to the development of groundbreaking technologies.

Conclusion

Mason A. Wolak's contributions to the field of dielectric film technology exemplify the impact of innovative thinking in materials science. His patent for multilayered high-temperature dielectric film represents a significant advancement in the industry.