Osaka, Japan

Masayoshi Tokuda

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 3.3

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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5 patents (USPTO):Explore Patents

Title: Masayoshi Tokuda: Innovator in Photosensitive Compositions

Introduction

Masayoshi Tokuda is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of 5 patents. His work has implications in various industries, particularly in the development of advanced materials.

Latest Patents

Tokuda's latest patents include a photosensitive composition that features a semiconductor particle, a photopolymerizable compound, and a photopolymerization initiator. This innovative composition is designed to enhance the performance of photosensitive materials. Additionally, he has developed a mixed composition that contains an organosilicon compound and a silicon compound, showcasing his versatility in material science.

Career Highlights

Throughout his career, Tokuda has worked with prominent companies such as Sumitomo Chemical Company, Limited and Nikon-Essilor Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking innovations in his field.

Collaborations

Some of his notable coworkers include Tomohiro Fukuura and Yoshihiro Harada. Their collaborative efforts have further advanced the research and development of photosensitive technologies.

Conclusion

Masayoshi Tokuda's contributions to the field of photosensitive compositions highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in material science.

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