Company Filing History:
Years Active: 1985-1988
Introduction
Masayasu Kitayama, a distinguished inventor based in Kawasaki, Japan, holds a total of two patents that showcase his significant contributions to the field of semiconductor technology. His innovations primarily focus on developing effective absorbents for treating hazardous gases critical to semiconductor manufacturing processes.
Latest Patents
Kitayama’s latest patents are centered around an absorbent and process designed for the removal of various toxic materials, such as silanes and arsine, which are commonly used in semiconductor products. The innovative absorbent consists of a first and second dry absorbent. The first absorbent utilizes a solid carrier made primarily of a porous inorganic silicate and is impregnated with an aqueous solution of alkali. The second absorbent also shares similar characteristics but is additionally treated with an aqueous solution of an oxidizing agent capable of oxidizing germane. The combination of these absorbents addresses the shortcomings of treatment processes when used alone, ensuring a thorough removal of various volatile inorganic hydrides. For optimal results, a third absorbent may also be incorporated, resulting in a comprehensive gas treatment process in two or three stages.
Career Highlights
Masayasu Kitayama has made notable advancements while working at Nihonsanso Kabushiki Kaisha. His work has focused on refining the processes and materials involved in the treatment of gases used for semiconductor manufacturing, establishing him as an authority in this critical technology area.
Collaborations
Throughout his career, Kitayama has collaborated with esteemed colleagues such as Yoshiaki Sugimori and Schunich Ohta. These partnerships have played a pivotal role in enhancing the depth of research and the efficiency of innovative solutions in gas treatment processes.
Conclusion
Masayasu Kitayama’s contributions to the development of absorbents for hazardous gas treatment embody the spirit of innovation essential for progress in semiconductor technology. His patents not only showcase his inventive prowess but also reflect a commitment to improving health and safety standards in the semiconductor industry. As he continues his work, his inventions will likely influence future advancements in this critical field.