Annaka, Japan

Masaya Ueno



Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Annaka, JP (2002 - 2019)
  • Kanra-machi, JP (2019)

Company Filing History:


Years Active: 2002-2019

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7 patents (USPTO):Explore Patents

Title: Masaya Ueno: Innovator in Semiconductor Cleaning Solutions

Introduction

Masaya Ueno is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of semiconductor cleaning technologies. With a total of 7 patents to his name, Ueno has developed innovative solutions that enhance the efficiency and effectiveness of cleaning semiconductor substrates.

Latest Patents

Ueno's latest patents include a cleaner composition and preparation of thin substrates. One of his notable inventions is a cleaner composition that consists essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C-Calcohol. This composition is effective for cleaning the surface of silicon semiconductor substrates. It achieves a satisfactory degree of cleanness within a short time and at high efficiency without causing corrosion to the substrate. Another patent involves a cleaner composition that consists of (A) 92.0 wt % to less than 99.9 wt % of an organic solvent, (B) 0.1 wt % to less than 8.0 wt % of a C-Calcohol, and (C) 0.001-3.0 wt % of a quaternary ammonium salt. This formulation effectively removes silicone adhesive residues on silicon semiconductor substrates, also achieving high efficiency without causing corrosion.

Career Highlights

Masaya Ueno is currently associated with Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of semiconductor cleaning solutions. His work has been instrumental in advancing the technology used in semiconductor manufacturing processes.

Collaborations

Ueno has collaborated with notable colleagues, including Hideyoshi Yanagisawa and Toshio Ohba. These collaborations have contributed to the development of effective cleaning solutions for semiconductor substrates.

Conclusion

Masaya Ueno's contributions to semiconductor cleaning technologies have made a significant impact in the industry. His innovative patents reflect his commitment to enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

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