Kanagawa, Japan

Masatoshi Fukushima


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Masatoshi Fukushima: Innovator in Semiconductor Manufacturing

Introduction

Masatoshi Fukushima is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent that enhances the reliability of semiconductor devices.

Latest Patents

Fukushima holds a patent for a manufacturing method of semiconductor devices. This invention involves a process that includes removing a patterned resist film, which is crucial for the production of reliable semiconductor devices. The method consists of several steps: introducing a gas containing oxygen into a processing room, initiating electric discharge to transform the gas into plasma, and introducing water vapor or alcohol vapor into the processing room. Notably, the introduction of vapor can occur either simultaneously with or after the plasma generation step.

Career Highlights

Masatoshi Fukushima is associated with Renesas Electronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that improve device performance and reliability.

Collaborations

Fukushima has collaborated with notable colleagues, including Toru Shinaki and Takehiko Saito. Their combined expertise contributes to the innovative environment at Renesas Electronics Corporation.

Conclusion

Masatoshi Fukushima's contributions to semiconductor manufacturing through his patented methods exemplify the importance of innovation in technology. His work continues to influence the reliability and efficiency of semiconductor devices in the industry.

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