Company Filing History:
Years Active: 1996
Title: Masato Nishikawa: Innovator in Photoresist Technology
Introduction
Masato Nishikawa is a notable inventor based in Haibara-gun, Japan. He has made significant contributions to the field of photoresist technology, particularly through his innovative compositions that enhance the performance of negative photoresists.
Latest Patents
Nishikawa holds a patent for a negative photoresist composition comprising a photosensitive compound. This invention is crucial for advancements in photolithography, which is widely used in semiconductor manufacturing.
Career Highlights
Masato Nishikawa is associated with Hoechst Japan Limited, where he has been instrumental in developing cutting-edge materials for the electronics industry. His work has positioned him as a key figure in the realm of photoresist technology.
Collaborations
Nishikawa has collaborated with notable colleagues, including Akihiko Igawa and Georg Pawlowski. These partnerships have fostered innovation and have contributed to the success of various projects within the company.
Conclusion
Masato Nishikawa's contributions to photoresist technology and his collaboration with esteemed colleagues highlight his importance in the field. His innovative spirit continues to drive advancements in semiconductor manufacturing.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.