Location History:
- Ibaraki, JP (1992 - 1993)
- Osaka, JP (1995 - 2001)
Company Filing History:
Years Active: 1992-2001
Title: Masato Katsukawa: Innovator in Electrophotosensitive Materials
Introduction
Masato Katsukawa is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of electrophotosensitive materials, holding a total of 9 patents. His work focuses on enhancing the performance and durability of photosensitive materials used in various applications.
Latest Patents
Katsukawa's latest patents include innovative electrophotosensitive materials that comprise a conductive substrate and a photosensitive layer. This layer features specific hole and electron transferring materials, along with a binding resin made from a polyester resin. The resin is a substantially linear polymer derived from a specific dihydroxy compound. This invention improves sensitivity and offers superior adhesion to conductive substrates, as well as enhanced mechanical strength, including wear resistance.
Career Highlights
Throughout his career, Masato Katsukawa has worked with notable companies such as Mita Industrial Co., Ltd. and Kyocera Mita Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of electrophotosensitive materials.
Collaborations
Katsukawa has collaborated with talented individuals, including Masashi Tanaka and Ichiro Yamazato. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Masato Katsukawa is a distinguished inventor whose work in electrophotosensitive materials has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to improving technology and materials.