Kyoto, Japan

Masami Kawabayashi


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Masami Kawabayashi: Innovator in Electrical Resistive Materials

Introduction

Masami Kawabayashi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of electrical resistive materials, particularly through his innovative patent. His work has implications for various applications, including thermal printing elements.

Latest Patents

Kawabayashi holds a patent for an electrical resistive material, which is a Cr--Al--B--Zr--O alloy. This material is specifically designed for use in heating elements for thermal printing applications. The alloy consists of a quaternary alloy and contains 15 to 25 atomic percent of oxygen. The quaternary alloy is composed of 2 to 25 atomic percent of zirconium, along with a ternary alloy that includes 35 to 55 atomic percent of chromium, 2 to 23 atomic percent of aluminum, and 37 to 58 atomic percent of boron. This innovative composition enhances the performance and efficiency of heating elements.

Career Highlights

Kawabayashi is associated with Susumu Co., Ltd., where he has been able to apply his expertise in material science. His work at the company has allowed him to focus on developing advanced materials that meet the demands of modern technology. His patent reflects his commitment to innovation and excellence in his field.

Collaborations

Throughout his career, Kawabayashi has collaborated with talented individuals such as Sadao Yoshizaki and Kazuya Nishimura. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Masami Kawabayashi's contributions to electrical resistive materials exemplify the spirit of innovation in the field of material science. His patent showcases his ability to develop advanced solutions that cater to the needs of modern applications. His work continues to inspire future advancements in technology.

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