Company Filing History:
Years Active: 1979-1982
Title: Masaichi Shinoda: Innovator in Semiconductor Technology
Introduction
Masaichi Shinoda is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the efficiency and performance of semiconductor devices.
Latest Patents
One of Masaichi Shinoda's latest patents is a method for producing a MOS semiconductor device. This innovation involves a metal layer of a metal-insulator-semiconductor type semiconductor device, which contains at least one cation-trapping element. The process includes heating the semiconductor substrate with the metal and oxide layers to diffuse ions responsible for the cation-trapping element, enhancing the surface passivation of the semiconductor device.
Another notable patent is a process for producing a semiconductor device, which includes an MISFET or a one transistor-one capacitor-memory cell. This method utilizes the excellent oxidation resistance of a silicon nitride film formed by direct nitridation. It also employs a covering layer made of polycrystalline silicon to form various regions of the semiconductor device in self-alignment, preventing short circuits between these regions.
Career Highlights
Masaichi Shinoda is currently associated with Fujitsu Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.
Collaborations
Masaichi has collaborated with notable coworkers such as Hajime Ishikawa and Takashi Ito. Their combined expertise has contributed to the successful development of various semiconductor technologies.
Conclusion
Masaichi Shinoda's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of advanced semiconductor devices, ensuring their efficiency and reliability in modern applications.