Osaka, Japan

Masahiro Ohashi


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2009-2012

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2 patents (USPTO):Explore Patents

Title: Masahiro Ohashi: Innovator in Plasma Arc Technology

Introduction

Masahiro Ohashi is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of plasma arc technology, holding a total of 2 patents. His work focuses on improving the efficiency and stability of plasma arc power supplies.

Latest Patents

Ohashi's latest patents include a plasma arc power supply and a control method that enhances the transition from a pilot arc to a main arc. This innovative power supply features a simple structure that allows for effective processing of workpieces by forming a pilot arc between a main electrode and a nozzle electrode. The design incorporates multiple direct current power supply units, ensuring that energy loss is minimized while maintaining a stable load current. This advancement in plasma arc technology not only reduces power consumption in low-current regions but also enhances the overall performance of plasma arc apparatuses.

Career Highlights

Throughout his career, Masahiro Ohashi has worked with prominent companies such as Sansha Electric Manufacturing Company, Limited and Sansha Manufacturing Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions in the field of plasma technology.

Collaborations

Ohashi has collaborated with notable colleagues, including Tetsuro Ikeda and Takayuki Nishisako. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in plasma arc applications.

Conclusion

Masahiro Ohashi's contributions to plasma arc technology demonstrate his commitment to innovation and efficiency. His patents reflect a deep understanding of electrical engineering and a drive to improve industrial processes. His work continues to influence the field and inspire future advancements in plasma technology.

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