Kyoto, Japan

Masaharu Kimura


Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 48(Granted Patents)


Location History:

  • Shiga, JP (1998 - 1999)
  • Horikawa-dori, JP (2007)
  • Kyoto, JP (2006 - 2008)

Company Filing History:


Years Active: 1998-2008

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Masaharu Kimura: Innovator in Substrate Treatment Technologies

Introduction

Masaharu Kimura is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treatment, holding a total of 5 patents. His innovative methods have advanced the technology used in various industrial applications.

Latest Patents

One of Kimura's latest patents is a substrate treatment method and apparatus designed for treating substrates by supplying a treatment liquid while rotating the substrate. This method involves a series of processes: first, a substrate rotation process where the substrate is clamped by a first clamping member set; second, a subsequent rotation process that utilizes both the first and a second clamping member set; and finally, a third rotation process that unclamps the substrate from the first clamping member set while continuing to clamp it with the second clamping member set. This innovative approach enhances the efficiency and effectiveness of substrate treatment.

Career Highlights

Throughout his career, Masaharu Kimura has worked with prominent companies such as Dainippon Screen Manufacturing Co., Ltd. and Mitsubishi Paper Mills Limited. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced substrate treatment technologies.

Collaborations

Kimura has collaborated with notable colleagues, including Kaoru Shimbara and Takashi Hara. These partnerships have fostered a creative environment that has led to the development of innovative solutions in substrate treatment.

Conclusion

Masaharu Kimura's contributions to substrate treatment technology exemplify his dedication to innovation. His patents and collaborations reflect a commitment to advancing industrial processes, making him a significant figure in his field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…