Company Filing History:
2 out of 1,030 
1 out of 263 
1 out of 97 
Years Active: 2023-2024
Title: Masafumi Akita: Innovator in EUV Lithography and Transparent Substrates
Introduction
Masafumi Akita is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of lithography and materials science, holding a total of 2 patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of various applications.
Latest Patents
One of Akita's latest patents is a reflective mask blank for EUV lithography. This innovative design includes a substrate with a reflective layer for reflecting EUV light, a protective layer, an absorption layer, and a hard mask layer. The protective layer contains ruthenium (Ru), while the absorption layer is made of tantalum (Ta). The hard mask layer consists of chromium (Cr) and at least one of nitrogen (N) and oxygen (O), with a film density ranging from 3.00 g/cm³ to 5.40 g/cm³. Another notable patent is for a transparent substrate with a laminated film. This substrate features a laminated film formed on at least one surface, which includes a first dielectric layer, a crystallinity-improving layer, a functional layer, and a second dielectric layer. The crystallinity-improving layer contains ZrN, and the functional layer includes various metal nitrides, ensuring optimal performance.
Career Highlights
Throughout his career, Masafumi Akita has worked with notable companies such as AGC Inc. and AGC Glass Europe. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in his field.
Collaborations
Masafumi Akita has collaborated with esteemed colleagues, including Hirotomo Kawahara and Hiroshi Hanekawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Masafumi Akita's contributions to the fields of EUV lithography and transparent substrates highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving materials and processes that are essential in various applications.