Company Filing History:
Years Active: 2006-2010
Title: Masaaki Kishimura: Innovator in Photoresist Polymer Technology
Introduction
Masaaki Kishimura is a prominent inventor based in Kakogawa, Japan. He has made significant contributions to the field of photoresist polymeric compounds, holding a total of 4 patents. His work focuses on processes that enhance the quality and efficiency of photoresist materials used in various applications.
Latest Patents
Kishimura's latest patents detail innovative processes for producing photoresist polymeric compounds. These processes involve polymerizing a mixture of specific monomers, including those with lactone skeletons and alicyclic structures. The methods also include extracting the formed polymer using organic solvents and water, ensuring that the metallic impurity content is extremely low, specifically at 1000 ppb by weight or less relative to the polymer.
Career Highlights
Masaaki Kishimura is currently employed at Daicel Chemical Industries, Ltd., where he continues to advance the field of polymer technology. His expertise in photoresist materials has positioned him as a key figure in the industry, contributing to the development of high-quality products.
Collaborations
Kishimura has collaborated with notable coworkers, including Hitoshi Watanabe and Hidetaka Hayamizu. These partnerships have fostered a collaborative environment that enhances innovation and research in their field.
Conclusion
Masaaki Kishimura's work in photoresist polymer technology exemplifies the importance of innovation in material science. His patents and contributions continue to influence the industry, showcasing his dedication to advancing technology.