Maryna Ornatska is a prominent inventor based in Hightstown, NJ (US). She has made significant contributions to the field of offset printing technologies, holding a total of 5 patents. Her innovative work focuses on developing advanced imaging members that enhance printing processes.

Latest Patents

Among her latest patents is an imaging member for offset printing applications. This imaging member features a surface layer composed of a fluorosilicone and an infrared-absorbing filler, with at least 75% of the siloxane units in the fluorosilicone being fluorinated. Additionally, she has developed another imaging member that includes a fluoroelastomer-perfluoropolyether composite, formed from a reaction mixture of a fluoroelastomer and a perfluoropolyether compound. Both patents also disclose methods for manufacturing the imaging member and processes for variably lithographic printing using these innovative members.

Career Highlights

Maryna Ornatska is currently employed at Xerox Corporation, where she continues to push the boundaries of printing technology. Her work has been instrumental in advancing the capabilities of offset printing, making it more efficient and effective.

Collaborations

Throughout her career, Maryna has collaborated with notable colleagues, including Santokh Singh Badesha and Mandakini Kanungo. These collaborations have further enriched her contributions to the field.

Conclusion

Maryna Ornatska stands out as a key figure in the innovation of offset printing technologies. Her patents and ongoing work at Xerox Corporation highlight her commitment to advancing the industry.

This text is generated by artificial intelligence and may not be accurate.