Company Filing History:
Years Active: 2004
Title: Marvin Mills - Innovator in Photolithography Measurement Systems
Introduction
Marvin Mills is a notable inventor based in Washougal, WA (US). He has made significant contributions to the field of photolithography through his innovative patent. His work focuses on enhancing measurement techniques that are crucial for the semiconductor manufacturing process.
Latest Patents
Marvin Mills holds a patent for an "Automatic in situ pellicle height measurement system." This invention provides a method for measuring the thickness of a photolithography element, such as a pellicle. The system involves projecting a light beam from various planes above and below the pellicle, allowing for precise measurement of its thickness based on the intensity of the light detected after passing through different media.
Career Highlights
Mills is currently employed at Wafertech, Inc., where he applies his expertise in photolithography and measurement systems. His innovative approach has led to advancements in the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Throughout his career, Marvin has collaborated with talented individuals such as Phong T Nguyen and Ming-Chun Chou. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the industry.
Conclusion
Marvin Mills is a distinguished inventor whose contributions to photolithography measurement systems have made a significant impact in the semiconductor field. His innovative patent showcases his commitment to advancing technology and improving manufacturing processes.