Company Filing History:
Years Active: 2006
Title: Martti Sonninen: Innovator in Precursor Material Delivery Systems
Introduction
Martti Sonninen is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of thin film deposition systems, particularly through his innovative patent related to precursor material delivery systems.
Latest Patents
Sonninen holds a patent for a "Precursor material delivery system for atomic layer deposition." This system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is established between the precursor container and the reaction space to receive at least one dose of the precursor material. This allows for a series of pulses to be released toward the reaction space. The precursor material is vaporized after loading it in the precursor container by heating or reducing the pressure inside the container. A vacuum line is coupled to the precursor container to reduce pressure without drawing particles into the reaction space. Additionally, a high conductivity particle filter with inertial traps may be included to filter particles from the precursor material.
Career Highlights
Sonninen is associated with Planar Systems, Inc., where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of atomic layer deposition systems.
Collaborations
He has collaborated with notable colleagues, including Bradley J. Aitchison and Jarmo Maula, contributing to a dynamic and innovative work environment.
Conclusion
Martti Sonninen's contributions to precursor material delivery systems highlight his role as an influential inventor in the field of thin film deposition. His innovative patent reflects his commitment to advancing technology in this area.