Eindhoven, Netherlands

Martinus Verheijen


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 159(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Martinus Verheijen: Innovator in Patterned Relief Technology

Introduction

Martinus Verheijen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of patterned relief technology, particularly through his innovative methods involving photoresist materials. His work has implications for various applications, including optics and microfabrication.

Latest Patents

Martinus Verheijen holds a patent for a method of providing a patterned relief of cured photoresist on a flat surface. This patent describes a technique for replicating a patterned synthetic resin relief on the surface of a glass substrate. The process involves applying a UV-curable acrylate lacquer to the glass surface, followed by the use of a transparent mold that is rolled over the surface. The lacquer is then cured using a UV light source, allowing for the formation of a relief with small dimensions of 10 times 10 micrometers on a large flat surface of 1 times 1 meter. This method is particularly advantageous as it minimizes large release forces during the replication process.

Career Highlights

Martinus Verheijen is associated with U.S. Philips Corporation, where he has been instrumental in advancing technologies related to his patent. His expertise in the field has allowed him to contribute to innovative solutions that enhance the capabilities of optical devices and materials.

Collaborations

Throughout his career, Martinus has collaborated with notable colleagues, including Jan Haisma and Johannes T. Schrama. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective fields.

Conclusion

Martinus Verheijen's contributions to the field of patterned relief technology exemplify the impact of innovative thinking in engineering and materials science. His patented methods continue to influence advancements in various applications, showcasing the importance of creativity and collaboration in driving technological progress.

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