Location History:
- Manhattan Beach, CA (US) (1983 - 1988)
- Redondo Beach, CA (US) (1996 - 2012)
Company Filing History:
Years Active: 1983-2012
Title: Martin S Leung: Innovator in Adaptive Technologies
Introduction
Martin S Leung is a prominent inventor based in Redondo Beach, California. He holds a total of seven patents, showcasing his expertise in innovative technologies. His work primarily focuses on adaptive systems and nanotechnology, contributing significantly to advancements in these fields.
Latest Patents
One of his latest patents is the "Adaptive Membrane Shape Deformation System." This system and method determine the shape of a surface, particularly for a deployed space-based adaptive flexible membrane antenna. It utilizes patterned projections, image capturing, and membrane shape processing to produce data that describes the contour of the membrane. This data is then used as input for a feedback control actuation system, allowing the membrane to maintain its desired three-dimensional shape.
Another notable patent is the "Electron Beam Lithography Method Forming Nanocrystal Shadowmasks and Nanometer Etch Masks." This process involves forming a nanocrystal nanostructure on an electron beam resist layer, which is then used to create an electron beam shadowmask. The nanostructures, made from semiconductor materials and metals like silver, enable the production of ultra-fine nanometer-sized structures for submicron devices, including semiconductors and microelectromechanical devices.
Career Highlights
Throughout his career, Martin has worked with esteemed organizations such as The Aerospace Corporation and Union Carbide Corporation. His contributions to these companies have been instrumental in advancing technology in aerospace and materials science.
Collaborations
Martin has collaborated with notable professionals in his field, including Neil A Ives and Gary W Stupian. These partnerships have further enriched his work and expanded the impact of his inventions.
Conclusion
Martin S Leung is a distinguished inventor whose work in adaptive technologies and nanotechnology has led to significant advancements. His innovative patents and collaborations reflect his commitment to pushing the boundaries of technology.