Martin Rössiger

Title: Martin Rössiger: Innovator in Semiconductor Technology

Introduction

Martin Rössiger is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to improving exposure methods in semiconductor manufacturing.

Latest Patents

Rössiger's latest patents include a method for adjusting a substrate in an appliance for carrying out exposure. This method involves measuring the unevenness of a chuck at various positions and storing these discrepancies from an idealized plane in a databank. The measured discrepancies are then used to calculate corrections for predetermined settings related to focus distance and tilt, which are applied differently for adjusting the exposure of the respective areas. Another notable patent is for aligning and exposing a semiconductor wafer. This method corrects exposure positions of exposure fields individually to compensate for processes affecting the locational position of alignment marks and oblique measurement structures. The corrections are applied based on the positional displacement determined from the comparison of measurement structures before and after the process.

Career Highlights

Martin Rössiger is currently employed at Infineon Technologies AG, where he continues to develop innovative solutions in semiconductor technology. His work has significantly impacted the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Rössiger collaborates with talented coworkers, including Thorsten Schedel and Jens Stäcker, who contribute to the advancement of technology in their field.

Conclusion

Martin Rössiger's contributions to semiconductor technology through his patents and work at Infineon Technologies AG highlight his role as an influential inventor. His innovative methods for exposure adjustment and alignment are paving the way for advancements in the semiconductor industry.