Company Filing History:
Years Active: 2013-2015
Title: Martin Pavlik: Innovator in Multilayer Film Technology
Introduction
Martin Pavlik is a notable inventor based in Wadenswil, Switzerland. He has made significant contributions to the field of multilayer film technology, holding a total of 2 patents. His work focuses on developing advanced materials that enhance the performance and functionality of films used in various applications.
Latest Patents
One of Martin Pavlik's latest patents is for ultra-stiff coextruded shrink films. This invention pertains to multilayer films that consist of four or more discrete layers. The films include two external layers made of linear low-density polyethylene resin, an internal stiffening layer composed of polypropylene or high-density polyethylene, and an internal shrink layer made of low-density polyethylene. These multilayer films achieve a gloss of at least 62% at 45 degrees, along with a 2% secant tensile modulus greater than 400 MPa.
Another significant patent by Pavlik involves polyolefin dispersion technology used for porous substrates. This method includes applying an aqueous dispersion to a porous substrate, which contains a thermoplastic polymer, a dispersing agent, and water. The process involves removing at least a portion of the water to create a breathable article.
Career Highlights
Martin Pavlik is currently associated with Dow Global Technologies LLC, where he continues to innovate and develop new materials. His expertise in multilayer film technology has positioned him as a key player in the industry.
Collaborations
Throughout his career, Martin has collaborated with talented individuals such as Gert Johannes Claasen and Miguel Alberto Prieto. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Martin Pavlik is a distinguished inventor whose work in multilayer film technology has led to significant advancements in the field. His innovative patents reflect his commitment to enhancing material performance and functionality.