Martin M Barrera

Title: Martin M Barrera: Innovator in Chemical Vapor Deposition Technologies

Introduction

Martin M Barrera is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of chemical vapor deposition, holding 2 patents that showcase his innovative approaches to fluid injection and semiconductor wafer heating.

Latest Patents

Barrera's latest patents include an "Apparatus and method of effective fluid injection and vaporization for chemical vapor deposition application." This invention utilizes a cross-flow injector to introduce fluids into a chemical vapor deposition process chamber. The design allows for efficient atomization and vaporization of the fluids, enhancing the overall process. The injector features a three-port cavity with an inlet nozzle, throat region, and exit nozzle, which are designed to create pressure differentials that ensure optimal fluid dynamics.

Another significant patent is the "Method of semiconductor wafer heating to prevent bowing." This method addresses the issue of bowing in semiconductor wafers during heating by utilizing a gas with high thermal conductivity, such as helium, or by maintaining a low pressure environment. This innovative approach helps to ensure the integrity of semiconductor wafers during processing.

Career Highlights

Martin M Barrera is currently employed at Novellus Systems Incorporated, where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in advancing the efficiency and effectiveness of chemical vapor deposition processes.

Collaborations

Barrera has collaborated with esteemed colleagues, including George D Kamian and Edward J McInerney, contributing to a dynamic and innovative work environment.

Conclusion

Martin M Barrera's contributions to the field of chemical vapor deposition and semiconductor technology highlight his role as a leading inventor. His patents reflect a commitment to innovation and excellence in engineering.