Randolph, NJ, United States of America

Martin J Schena


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Martin J Schena: Innovator in Nylon Compositions

Introduction

Martin J Schena is a notable inventor based in Randolph, NJ (US). He has made significant contributions to the field of materials science, particularly in the development of nylon-based compositions. His innovative work has led to advancements in the production of films that are both functional and efficient.

Latest Patents

Martin J Schena holds a patent for "Nylon 6 or 66 based compositions and films formed therefrom." This patent describes super-miscible blends of nylon copolymers, which result in multilayered film structures. The nylon composition is characterized as a substantially uniform blend of at least one semi-crystalline copolymer I and at least one semi-crystalline copolymer II. Notably, these compositions exhibit a single melting point, enhancing their uniformity. The coextruded films created from this nylon composition, when combined with olefin-containing polymers, are particularly suitable for use as barrier films, such as aroma barrier films, which demonstrate reduced curl.

Career Highlights

Throughout his career, Martin has been associated with AlliedSignal Inc., where he has applied his expertise in materials science to develop innovative solutions. His work has not only contributed to the company's success but has also advanced the field of polymer science.

Collaborations

Martin has collaborated with several esteemed colleagues, including Yash P Khanna and Frank H Puterbaugh, Jr. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in nylon compositions.

Conclusion

Martin J Schena's contributions to the field of nylon-based compositions and films have established him as a significant figure in materials science. His innovative patent and collaborations reflect his commitment to advancing technology in this area.

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