Faringdon, United Kingdom

Martin Harte



Average Co-Inventor Count = 4.8

ph-index = 1


Company Filing History:


Years Active: 2004-2005

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Martin Harte: Innovator in Plasma Technology

Introduction

Martin Harte is a notable inventor based in Faringdon, GB. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on enhancing gas reactions through innovative reactor designs.

Latest Patents

Harte's latest patents include the Plasma Enhanced Gas Reactor and the Corona Discharge Reactor. The Plasma Enhanced Gas Reactor features a reaction chamber that is designed to be coupled to a source of microwave radiation. A pair of opposed field enhancing electrodes concentrate microwave energy to form plasma in a localized region between the electrodes. Gas passages are arranged to allow a gaseous medium to pass into and out of the chamber, ensuring that the medium interacts with the plasma. The electrodes consist of electrically conducting tubes held in electrode holders located in the chamber wall, allowing for easy removal and replacement from outside the apparatus. The Corona Discharge Reactor is a modular design where individual reactor chambers are arranged vertically and grouped in serial pairs, enhancing efficiency and functionality.

Career Highlights

Throughout his career, Martin Harte has worked with prominent companies such as Accentus Plc and Qinetiq Limited. His experience in these organizations has contributed to his expertise in plasma technology and reactor design.

Collaborations

Harte has collaborated with notable individuals in his field, including Robert Francis King and Stephen Ivor Hall. These partnerships have furthered his research and development efforts in innovative technologies.

Conclusion

Martin Harte is a distinguished inventor whose work in plasma technology has led to significant advancements in gas reaction processes. His patents and collaborations reflect his commitment to innovation and excellence in his field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…