Martin Ben-Dayan

Title: Martin Ben-Dayan: Innovator in Nanosilica Compositions

Introduction

Martin Ben-Dayan is a notable inventor based in New York, NY (US). He has made significant contributions to the field of materials science, particularly through his innovative work with nanosilica-based compositions. His expertise and creativity have led to advancements that enhance device performance and protection.

Latest Patents

Martin holds a patent for "Nanosilica based compositions, structures and apparatus incorporating same and related methods." This patent describes silica-based compositions that can be utilized in coatings, films, or other cast structures. One embodiment of his invention includes a hybrid nanosilica (HNS) composition that consists of tetraethylorthosilicate (TEOS), methyl triethoxysilane (MTEOS), and glycidoxypropyltrimethoxysilane (GPTMS). The composition is designed to provide various types of protection and enhance device performance. For instance, it can be used for impact protection or corrosion resistance. Additionally, optically enhancing nanoparticles can be incorporated into the HNS material to serve as an antireflective coating (ARC) for various optical applications.

Career Highlights

Martin is currently associated with Metashield LLC, where he continues to develop innovative solutions in the field of materials science. His work has garnered attention for its practical applications and potential to improve product durability and functionality.

Collaborations

Some of Martin's coworkers include Glenn A Mesa, Jr. and Puruswottam Aryal. Their collaborative efforts contribute to the innovative environment at Metashield LLC, fostering advancements in technology and materials.

Conclusion

Martin Ben-Dayan's contributions to nanosilica compositions exemplify the impact of innovation in materials science. His patent and ongoing work at Metashield LLC highlight the importance of developing advanced materials for enhanced device performance and protection.