Boise, ID, United States of America

Markus Chmielus

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: Innovations of Markus Chmielus in Magnetic Materials

Introduction

Markus Chmielus is a notable inventor based in Boise, ID (US), recognized for his contributions to the field of magnetic materials. He holds two patents that showcase his innovative approach to creating materials with significant magnetic-field-induced deformation.

Latest Patents

Chmielus's latest patents include "Polycrystalline foams exhibiting giant magnetic-field-induced deformation and methods of making and using same" and "Magnetic materials and methods exhibit large magnetic-field-induced deformation/strain (MFIS) through the magnetic-field-induced motion of crystallographic interfaces." These patents detail the development of porous, polycrystalline composite structures made from magnetic shape memory alloys, particularly polycrystalline Ni-Mn-Ga. His work demonstrates the ability to achieve large MFIS values, significantly enhancing the performance of magnetic materials.

Career Highlights

Throughout his career, Markus Chmielus has worked at esteemed institutions such as Boise State University and Northwestern University. His research has focused on advancing the understanding and application of magnetic materials, particularly in the context of their structural properties and potential uses in various technologies.

Collaborations

Chmielus has collaborated with notable colleagues, including Peter Mullner and David C. Dunand, contributing to the advancement of research in magnetic materials and their applications.

Conclusion

Markus Chmielus's innovative work in the field of magnetic materials has led to significant advancements in the understanding and application of these materials. His patents reflect a commitment to enhancing the capabilities of magnetic materials, paving the way for future technological developments.

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