Company Filing History:
3 out of 996 
3 out of 5 Years Active: 1999-2000
Title: Marko Tuominen: Innovator in Epitaxial Growth Technology
Introduction
Marko Tuominen is a notable inventor based in Linkoping, Sweden. He has made significant contributions to the field of epitaxial growth technology, particularly in the development of devices and methods for growing semiconductor materials.
Latest Patents
Tuominen holds 3 patents related to his innovative work. His latest patents include a device for epitaxially growing objects, which involves a method for growing silicon carbide (SiC) and Group III-nitrides on a substrate. This method utilizes a susceptor with circumferential walls to heat the substrate and source material above a critical temperature, facilitating the growth process. Another patent details a device designed for Chemical Vapor Deposition, featuring a dual-conduit system that optimizes the flow of carrier and reactive gases to enhance the growth of semiconductor materials.
Career Highlights
Throughout his career, Tuominen has worked with prominent companies such as ABB Research Ltd. and Okmetic Ltd. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and epitaxial growth processes.
Collaborations
Tuominen has collaborated with notable colleagues, including Olle Kordina and Christer Hallin. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Marko Tuominen's work in epitaxial growth technology showcases his innovative spirit and dedication to advancing semiconductor manufacturing processes. His contributions continue to influence the field and inspire future developments.