Espoo, Finland

Markku Orpana


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 420(Granted Patents)


Company Filing History:


Years Active: 1996-1999

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5 patents (USPTO):Explore Patents

Title: **Markku Orpana: Innovator in Gas Measurement Technologies**

Introduction

Markku Orpana is a notable inventor based in Espoo, Finland, recognized for his contributions to gas measurement technologies. With a total of five patents to his name, his innovations have advanced various methodologies in this critical field, showcasing his expertise and dedication to research and development.

Latest Patents

Among his latest patents, the "Overpressure Protector" and the "Single-channel Gas Concentration Measurement Method and Apparatus" stand out. The single-channel method utilizes a radiant source to generate a measuring signal, which is directed toward a measurement object containing a gas mixture. The measuring signal is subjected to bandpass filtering using at least two passband wavelengths and detected by a specialized detector. Notably, the bandpass filtering step relies on a single electrostatically tunable, short-resonator Fabry-Perot interferometer, demonstrating innovative techniques in accurate gas measurement.

Career Highlights

Markku has worked for esteemed companies such as Vaisala Oy and Instrumentarium Oy, where he played pivotal roles in developing cutting-edge measurement technologies. His commitment to innovation within these organizations has further solidified his status as a leading inventor in his field.

Collaborations

Throughout his career, Markku has collaborated with prominent peers, including Ari Lehto and Martti Blomberg. These partnerships have enriched his perspective and driven collaborative advancements in the technologies related to gas measurement and analysis.

Conclusion

Markku Orpana's contributions to the field of gas measurement not only reflect his individual talent as an inventor but also highlight the importance of teamwork and innovation in driving technological advancements. His patented works continue to influence the industry, paving the way for future developments in gas concentration measurement methods.

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