Company Filing History:
Years Active: 2016-2017
Title: Mark Wayne Lee: Innovator in Boron Chemistry
Introduction
Mark Wayne Lee is a distinguished inventor based in Columbia, MO (US). He has made significant contributions to the field of boron chemistry, particularly in the development of novel compounds with potential applications in cancer treatment. With a total of 2 patents, Lee's work showcases his innovative approach to solving complex scientific challenges.
Latest Patents
Lee's latest patents include a process and device for the production of polyhedral boranes. This invention provides methods and devices for producing polyhedral boron compounds through an anhydrous, one-pot process. The process involves a pyrolytic reaction of a tetraborohydride with a quaternary amine salt to form the polyhedral borane. Another notable patent focuses on small molecule inhibitors of nicotinamide phosphoribosyltransferase (NAMPT). This invention relates to novel compounds that serve as anti-cancer agents, containing cluster boron moieties such as carborane or borohydride. These compounds act as inhibitors for the enzyme Nampt, demonstrating greater biological inhibition and antiproliferative effects compared to other small molecule inhibitors.
Career Highlights
Mark Wayne Lee is affiliated with the University of Missouri, where he continues to advance research in boron chemistry. His work has garnered attention for its potential impact on cancer therapies and materials science. Lee's innovative spirit and dedication to research have positioned him as a key figure in his field.
Collaborations
Lee collaborates with esteemed colleagues such as Marion Frederick Hawthorne and Yulia Sevryugina. These partnerships enhance the research environment and foster the development of groundbreaking innovations.
Conclusion
Mark Wayne Lee's contributions to boron chemistry and cancer research exemplify the spirit of innovation. His patents reflect a commitment to advancing scientific knowledge and improving therapeutic options. Lee's work continues to inspire future generations of inventors and researchers.