Mark R Visokay

Title: Mark R Visokay: Innovator in Thin Film Technology

Introduction

Mark R Visokay is a prominent inventor based in Stanford, CA (US). He has made significant contributions to the field of materials science, particularly in the development of thin film technologies. With a total of 2 patents, his work focuses on creating advanced materials with unique properties.

Latest Patents

Visokay's latest patents include a method for producing uniaxial tetragonal thin films of ternary intermetallic compounds. This innovative method allows for the creation of oriented thin films that exhibit uniaxial magnetic, optical, electronic, and mechanical properties. The process involves selecting a suitable substrate material that does not chemically react with the ternary intermetallic compound. The substrate is then heated, and a combination of three metals is deposited to form a thin film with desired properties. Another patent details the production of oriented intermetallic thin film structures, which are assembled using sputter deposition techniques. These films demonstrate pronounced uniaxial properties, making them valuable for various applications.

Career Highlights

Mark R Visokay is affiliated with Leland Stanford Junior University, where he conducts research and develops innovative technologies. His work has garnered attention in the scientific community, contributing to advancements in thin film applications.

Collaborations

Visokay has collaborated with notable colleagues, including Bruce M Lairson and Robert Sinclair. These partnerships have further enhanced his research and development efforts in the field of materials science.

Conclusion

Mark R Visokay's contributions to thin film technology exemplify the innovative spirit of modern science. His patents reflect a commitment to advancing materials with unique properties, paving the way for future developments in various industries.