Mark N Jobes

Title: Mark N Jobes: Innovator in Optical Proximity Correction

Introduction

Mark N Jobes is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of optical proximity correction, which is crucial for enhancing the accuracy of printed circuit designs. His innovative work has led to the development of a unique patent that addresses challenges in this area.

Latest Patents

Mark N Jobes holds a patent for "Creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printing." This patent encompasses methods, program products, and systems designed to create a knowledge base for optical proximity correction (OPC). The methods involve fabricating a circuit using a proposed IC layout, identifying features in the fabricated circuit's image, and predicting the presence of printed sub-resolution assist features (SRAF). The process includes adjusting predictive algorithms based on the accuracy of predictions and storing images in a repository for training data. He has 1 patent to his name.

Career Highlights

Mark N Jobes is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His role involves leveraging his expertise in optical proximity correction to improve circuit fabrication processes. His work is instrumental in advancing the technology used in semiconductor manufacturing.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Kriteshwar Kaur Kohli and Ioana C Graur. These collaborations have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Mark N Jobes is a distinguished inventor whose work in optical proximity correction has made a significant impact on the semiconductor industry. His patent and contributions continue to influence advancements in circuit design and fabrication.