Fremont, CA, United States of America

Mark Merrill

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Mark Merrill

Introduction

Mark Merrill is an accomplished inventor based in Fremont, California. He has made significant contributions to the field of technology, particularly in the area of substrate processing. His innovative work has led to the development of a unique patent that enhances the efficiency of ion beam etching.

Latest Patents

Mark Merrill holds a patent for a "Method and apparatus for anisotropic pattern etching and treatment." This patent discusses methods and apparatuses for providing an anisotropic ion beam for etching and treatment of substrates. In one embodiment, the system for processing a substrate includes a chamber, a chuck assembly, an ion source, and a grid system. The ion source features grid system interfaces that connect both the chamber and the ion source, incorporating a plurality of holes through which ions are extracted to form an ion beam. The grid system is oriented to direct the ion beam into the chamber toward the substrate support. The array of holes is defined vertically by a y-axis and horizontally by an x-axis, with hole densities varying vertically in the y-axis. This design causes the ion beam to have an energy density gradient defined vertically in the y-axis. Mark Merrill's innovative approach has resulted in 1 patent.

Career Highlights

Mark Merrill is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his expertise in ion beam technology and substrate processing. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Mark has collaborated with talented coworkers, including Seokmin Yun and Shuogang Huang. Their combined efforts have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Mark Merrill's contributions to the field of substrate processing through his innovative patent demonstrate his commitment to advancing technology. His work at Lam Research Corporation and collaborations with skilled colleagues further highlight his impact in the industry.

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