Mark L Naiman

Title: Mark L Naiman: Innovator in Integrated Circuit Technology

Introduction

Mark L Naiman is a distinguished inventor based in Lincoln, MA (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 2 patents. His work focuses on innovative methods for forming conductive paths in multi-layer metal structures.

Latest Patents

Naiman's latest patents include a method of forming a conductive path by low power laser pulse. This patent describes an integrated circuit device that features a link point for electrically connecting multiple metal layers. The device comprises a first metal layer, a link insulating layer, and a second metal layer. A diffusion barrier may be employed between the link insulator layer and each of the metal layers. The connection of the metal layers is achieved by exposing the link point to a low-power laser for a relatively long pulse width. Another patent details a method of making a conductive path in multi-layer metal structures, which similarly involves an integrated circuit device with a link point and diffusion barrier layers.

Career Highlights

Mark L Naiman is affiliated with the Massachusetts Institute of Technology, where he continues to advance research in integrated circuit technology. His innovative approaches have garnered attention in the field, contributing to the development of more efficient electronic devices.

Collaborations

Naiman has collaborated with notable colleagues, including Jack I Raffel and John A Yasaitis. Their combined expertise has furthered advancements in integrated circuit technology.

Conclusion

Mark L Naiman's contributions to integrated circuit technology through his innovative patents and collaborations highlight his role as a key inventor in the field. His work continues to influence the development of electronic devices, showcasing the importance of innovation in technology.