Company Filing History:
1 out of 832,812 Years Active: 1997
Title: The Innovative Contributions of Mark Keil
Introduction
Mark Keil is a notable inventor based in Norman, OK (US). He has made significant contributions to the field of surface etching technology. His innovative approach has led to the development of a unique method and apparatus that utilizes atomic fluorine for etching surfaces.
Latest Patents
Mark Keil holds a patent for a "Method and apparatus for etching surfaces with atomic fluorine." This invention involves generating a molecular or atomic fluorine jet or beam under vacuum conditions for the purpose of etching surfaces. The apparatus is designed using a hollow crystalline tube, preferably made from a Group II fluoride such as magnesium fluoride. By heating a terminal portion of the tube to over 1000 degrees Celsius, a mixture of fluorine gas and an inert carrier gas is induced under pressure into the tube. The result is an atomic fluorine jet that can be collimated into a beam and directed at masked surfaces for selective etching. This technology allows for rapid and highly anisotropic etching of materials.
Career Highlights
Throughout his career, Mark Keil has demonstrated a commitment to advancing etching technologies. His work has not only contributed to the scientific community but has also paved the way for practical applications in various industries.
Collaborations
Mark has collaborated with notable colleagues, including Joel H Young and Kyle Copeland. Their combined expertise has further enhanced the development and application of innovative technologies in their field.
Conclusion
Mark Keil's contributions to the field of surface etching through his patented technology exemplify the spirit of innovation. His work continues to influence advancements in etching methods, showcasing the importance of creativity and collaboration in scientific research.