Company Filing History:
Years Active: 2004
Title: The Innovative Mind of Mark K. Mondol in Charged Particle Beam Technology
Introduction
Mark K. Mondol is a notable inventor based in Cambridge, MA, recognized for his contributions to the field of lithography through innovative patent work at IBM. His expertise in spatial phase locking with shaped electron beam lithography has made significant advancements in how charged particle beams are utilized in various applications.
Latest Patents
Mr. Mondol holds one patent that showcases his ingenuity: "Spatial phase locking with shaped electron beam lithography." This invention provides a method for the precise positioning of a charged particle beam without the need for intrusive fiducial marks. By employing a dithered shadow pattern, preferably in a grid format, he enables real-time phase-locked position correction, enhancing the accuracy of mask making. The design minimizes interference with the uniformity of beam illumination, thus increasing the efficiency of the charged particle beam's application.
Career Highlights
Throughout his career at International Business Machines Corporation, Mark has demonstrated expertise in cutting-edge technologies related to electron beams. His innovative approach has positioned him as a leader in his field, allowing him to significantly contribute to advancements in lithography processes, which are crucial for various industries.
Collaborations
At IBM, Mark K. Mondol collaborates with other talented individuals, including Juan Ferrera and James Gregory Goodberlet. Their collective efforts foster a dynamic environment for innovation, enabling the development of breakthrough technologies that push the boundaries of what is possible in charged particle beam applications.
Conclusion
Mark K. Mondol exemplifies the spirit of innovation through his work in lithography, pushing the envelope of technology with his patent on spatial phase locking. His dedication to advancing charged particle beam applications has left a lasting impact in his field and continues to inspire future innovations.